說明:
使用目的: 二極體高溫擴散製程使用
型式: 爐管(muffle)式
採用高品質進口石英爐管
最高品質進口電熱線 (熱膨脹係數特低)
電熱器及爐管可單獨換裝 (換裝操作簡易)
可分區控制同一支爐管前中後的爐溫
規格尺寸:
| 使用溫度 | 均溫性能 | 加熱機制 | 輸送 | 批次式 | 爐氣氛 |
| Max 1300℃ | ±5℃ | 遠紅外熱輻射 | 可選用 | 大氣或N2 |
Diffusion Furnace
Phosphorous Diffusion is widely used in manufacture of solar cells. Silicon wafers are doped with small amounts of phosphorous to create the n-junction of the solar cell. This process is accomplished de depositing phosphorous vapor or coating on top of a silicon substrate. It is then fired at temperatures between 800℃ and 1000℃ to drive the phosphorous into the silicon, thus creating the n-junction
Features
- In-Line Diffusion Furnace
- The system can be configured to process up to 1,500 wafters per hour providing uniform and repeatable emitters
Applications
Specifications
- Silicon wafers are coated with a phosphoric acid solution and diffused in a quartz-lined continuous furnace between 850 and 900℃
CE Compliance
- This option is for the design and manufacture of the furnace evaluated to the requirements of the Machinery Directive (2006/42/EC) and Electromagnetic Compatibility (EMC) Directive (2004/108/EC). Our company offers self compliance to the Directives and the applicable harmonized standards. This
其它說明：